Hideharu Shintani
An aromatic polysulfone consists of 4,4’-diol aromatic compound and 4,4’-dichlorodiphenyl sulfone. As 4,4’-diol aromatic compounds, there exists bisphenol A, p-dihydroxy benzene, 4,4’-diphenol methane and p,p’-diphenol (bisphenol) and they were compared to study which compound would indicate the most resistant to gamma-ray exposure. Sulfur dioxide (SO2) from 4,4’-dichlorodiphenyl sulfone was used as an indicator for evaluation. The use of bisphenol in the preparation of polysulfone indicated the most resistant to the gamma-ray irradiation exposure and least production of SO2 among aromatic diol compounds tested. This indicated polysulfone free from bisphenol A is producible. The production of SO2 from bisphenol-based polysulfone was around 43% of bisphenol A based polysulfone. The rate of decrease of tensile strength correlated well with the order of radiation resistance. The fracture toughness of bisphenol A based polysulfone decreased with irradiation dose, but the bisphenol based polysulfone maintained its original ductility.
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