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Chemical Sciences Journal

ISSN: 2150-3494

Open Access

Study of SiO2 Etching using Plasma Diagnostics

Abstract

Rami Onkar*

Plasma is described as semi-neutral plasma of charged, unbiased particles that exhibits collective behaviour. The distinctive features that distinguish plasma from other release characteristics are applied in many contemporary and research sectors, such as regulating the component particles for specific uses.

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